Planar silicon-based light polarizers

被引:12
作者
Diener, J [1 ]
Künzer, N
Gross, E
Kovalev, D
Fujii, M
机构
[1] Tech Univ Munich, Phys Dept E16, D-85747 Garching, Germany
[2] Kobe Univ, Fac Engn, Dept Elect & Elect Engn, Nada Ku, Kobe, Hyogo 6578501, Japan
关键词
D O I
10.1364/OL.29.000195
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Silicon-based thin-film polarizers operating in the visible and near-infraed spectral range are fabricated by electrochemical etching of bulk silicon wafers. Anisotropically etched (110) porous silicon layers exhibit a strong in-plane anisotropy of the refractive index. Stackes of alternating layers with different mean refractive indices and thicknesses act as dichroic Bragg reflectors or microcavities, respectively., Both structures have two distinct reflection and transmission bands depending on the polarization of the incident linearly polarized light. Planar polarizers are realized through the combination, in one structure, of a dichroic reflector with. either a second reflector or a microcavity with different spectral responses. (C) 2004 Optical Society of America
引用
收藏
页码:195 / 197
页数:3
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