Silicon nano-transistors for logic applications

被引:34
作者
Chau, R [1 ]
Boyanov, B [1 ]
Doyle, B [1 ]
Doczy, M [1 ]
Datta, S [1 ]
Hareland, S [1 ]
Jin, B [1 ]
Kavalieros, J [1 ]
Metz, M [1 ]
机构
[1] Intel Corp, Components Res, Hillsboro, OR 97124 USA
关键词
nano-technology; integrated circuits; transistors-field effect;
D O I
10.1016/S1386-9477(03)00284-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Silicon transistors have undergone rapid miniaturization in the past several decades. Recently reported CMOS devices have dimensional scales approaching the "nano-transistor" regime. This paper discusses performance characteristics of a MOSFET device with 15 nm physical gate length. In addition, aspects of a non-planar CMOS technology that bridges the gap between traditional CMOS and the nano-technology era will be presented. It is likely that this non-planar device will form the basic device architecture for future generations of nano-technology. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:1 / 5
页数:5
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