Enhanced capacitive property of HfN film electrode by plasma etching for supercapacitors

被引:53
作者
Gao, Zecui [1 ]
Wu, Zhengtao [1 ]
Zhao, Shengsheng [2 ]
Zhang, Tengfei [1 ]
Wang, Qimin [1 ]
机构
[1] Guangdong Univ Technol, Sch Electromech Engn, Guangzhou 510006, Guangdong, Peoples R China
[2] Shenzhen Polytech, Shenzhen 518055, Peoples R China
基金
中国国家自然科学基金;
关键词
HfN thin films; Physical vapour deposition; Plasma etching; Supercapacitor; Electrochemical properties; TITANIUM NITRIDE FILMS; RADICAL OXIDATION; ENERGY;
D O I
10.1016/j.matlet.2018.10.032
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transition metal nitrides (TMN) films, fabricated by physical vapor deposition (PVD), have attracted much attention in supercapacitor electrode applications due to their high conductivity, easily-controlled composition, high structural and chemical stability, and good cycling life, which are promising candidates for flexible thin-film supercapacitors and on-chip micro-supercapacitors. The main drawback of the PVD-TMN film electrodes is that they have relatively dense structure and smooth surface, which limits their specific surface area and capacitive performance of the supercapacitors. In this work, a novel strategy was employed to modify the surface morphology of TMN films by plasma etching technology. HfN films with high conductivity were chosen to be deposited by reactive DC magnetron sputtering, followed by plasma etching using Ar and Kr gases. Effects of plasma etching on the microstructure, surface morphology and electrochemical properties of the HfN films were investigated. The results indicated that plasma etching significantly changed the surface morphology and enhanced specific capacitance of the HfN films. (C) 2018 Elsevier B.V. All rights reserved.
引用
收藏
页码:148 / 152
页数:5
相关论文
共 13 条
[1]   Titanium vanadium nitride electrode for micro-supercapacitors [J].
Achour, A. ;
Lucio-Porto, R. ;
Chaker, M. ;
Arman, A. ;
Ahmadpourian, A. ;
Soussou, M. A. ;
Boujtita, M. ;
Le Brizoual, L. ;
Djouadi, M. A. ;
Brousse, T. .
ELECTROCHEMISTRY COMMUNICATIONS, 2017, 77 :40-43
[2]   Titanium nitride films for micro-supercapacitors: Effect of surface chemistry and film morphology on the capacitance [J].
Achour, Amine ;
Lucio Porto, Raul ;
Soussou, Mohamed-Akram ;
Islam, Mohammad ;
Boujtita, Mohammed ;
Aissa, Kaltouma Ait ;
Le Brizoual, Laurent ;
Djouadi, Abdou ;
Brousse, Thierry .
JOURNAL OF POWER SOURCES, 2015, 300 :525-532
[3]   Sputter deposited chromium nitride thin electrodes for supercapacitor applications [J].
Arif, Mohd ;
Sanger, Amit ;
Singh, Arun .
MATERIALS LETTERS, 2018, 220 :213-217
[4]   Comparison of the rate capability of nanostructured amorphous and anatase TiO2 for lithium insertion using anodic TiO2 nanotube arrays [J].
Fang, Hai-Tao ;
Liu, Min ;
Wang, Da-Wei ;
Sun, Tao ;
Guan, Dong-Sheng ;
Li, Feng ;
Zhou, Jigang ;
Sham, Tsun-Kong ;
Cheng, Hui-Ming .
NANOTECHNOLOGY, 2009, 20 (22)
[5]   Vertical nanostructure arrays by plasma etching for applications in biology, energy, and electronics [J].
He, B. ;
Yang, Y. ;
Yuen, M. F. ;
Chen, X. F. ;
Lee, C. S. ;
Zhang, W. J. .
NANO TODAY, 2013, 8 (03) :265-289
[6]   Materials science - Electrochemical capacitors for energy management [J].
Miller, John R. ;
Simon, Patrice .
SCIENCE, 2008, 321 (5889) :651-652
[7]   Electrical conduction in aluminum nitride-single-walled carbon nanotube nanocomposites [J].
Singh, R. ;
Chakravarty, A. ;
Chowdhury, U. ;
Bhattacharya, D. ;
Biswas, S. K. .
MATERIALS LETTERS, 2018, 215 :144-147
[8]   CrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitors [J].
Wei, Binbin ;
Liang, Hanfeng ;
Zhang, Dongfang ;
Wu, Zhengtao ;
Qi, Zhengbing ;
Wang, Zhoucheng .
JOURNAL OF MATERIALS CHEMISTRY A, 2017, 5 (06) :2844-2851
[9]   FRACTIONATION OF XE, KR, AND AR IN THE SOLAR CORPUSCULAR RADIATION DEDUCED BY CLOSED-SYSTEM ETCHING OF LUNAR SOILS [J].
WIELER, R ;
BAUR, H .
ASTROPHYSICAL JOURNAL, 1995, 453 (02) :987-997
[10]   Influence of N2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering [J].
Yuan, Longyan ;
Fang, Guojia ;
Li, Chun ;
Wang, Mingjun ;
Liu, Nishuang ;
Ai, Lei ;
Cheng, Yanzhao ;
Gao, Huimin ;
Zhao, Xingzhong .
APPLIED SURFACE SCIENCE, 2007, 253 (20) :8538-8542