Roll-type photolithography for continuous fabrication of narrow bus wires

被引：19

作者：

Lee, Sung Ho ^{[1
]}

Lee, Ji Hoon ^{[1
]}

Park, Cheolwoo ^{[1
]}

Kwak, Moon Kyu ^{[1
,2
]}

机构：

[1] Kyungpook Natl Univ, Sch Mech Engn, Daegu 41566, South Korea

[2] Ncoretechnol Co Ltd, Res Ctr, Daegu 41566, South Korea

来源：

JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 2016年 / 26卷 / 11期

基金：

新加坡国家研究基金会;

关键词：

continuous process; photolithography; roll-to-roll; bus wire; wet etching; TO-ROLL; NANOIMPRINT LITHOGRAPHY; RESOLUTION; SURFACE;

D O I：

10.1088/0960-1317/26/11/115008

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper presents a continuous patterning method to enhance the productivity of metallic microstructure fabrication. The minimum exposure time and the optimum ultraviolet (UV) intensity were determined for the photoresist (PR) to develop micro PR patterns in continuous roll-type photolithography. To confirm the efficiency of continuous roll-type photolithography, wet etching was performed instead of dry etching as a post-lithography process. Parametric study results showed that the minimum exposure time required for sufficient PR reaction during continuous roll-type photolithography was 0.2s under 1000 mW cm(-2) of UV intensity. This study demonstrated roll-type photolithography and determined the highest production speed for continuous roll-type photolithography to be 24 mm s(-1). Continuous photolithography and wet etching were employed to produce narrow copper bus wires for a bezel-less display panel, indicating the practical applications of continuous roll-type photolithography.

引用

页数：6

共 26 条

[1] High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates [J].