Vertically aligned carbon nanotubes grown by plasma enhanced chemical vapor deposition

被引:20
作者
Sato, H [1 ]
Tagegawa, H [1 ]
Saito, Y [1 ]
机构
[1] Mie Univ, Fac Engn, Tsu, Mie 5148507, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 06期
关键词
D O I
10.1116/1.1627332
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Plasma enhanced chemical vapor deposition, which enables growth of carbon nanotubes directly onto substrates, is potentially suitable for preparing carbon nanotubes as electron sources in field emission displays.,In this article, we report the growth of aligned carbon nanotubes by microwave plasma enhanced chemical vapor deposition and investigate the effect of various parameters on the growth. Comparison among three catalysts (Fe, Co, and Ni) revealed that Fe gives the longest carbon nanotubes, while Co gives the carbon nanotubes with the smallest diameter. The growth of the carbon nanotubes strongly depends on the treatment time in the plasma. Field emission characteristics from the carbon nanotubes grown by the microwave plasma enhanced chemical vapor deposition are also shown. (C) 2003 American Vacuum Society.
引用
收藏
页码:2564 / 2568
页数:5
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