A Holistic Metrology Approach: Multi-Channel Scatterometry for Complex Applications

被引：4

作者：

Bozdog, Cornel ^{[1
]}

Kim, Hyang Kyun ^{[1
]}

Emans, Susan ^{[1
]}

Sherman, Boris ^{[2
]}

Turovets, Igor ^{[2
]}

Urenski, Ronen ^{[2
]}

Brill, Boaz ^{[2
]}

Vaid, Alok ^{[3
]}

Sendelbach, Matthew ^{[4
]}

机构：

[1] Nova Measuring Instruments Inc, 4701 Patrick Henry Dr,Suite 1701, Santa Clara, CA 95054 USA

[2] Nova Measuring Instruments LTD, IL-76100 Rehovot, Israel

[3] GLOBALFOUNDRIES, Fishkill, NY 12533 USA

[4] IBM Corp, Fishkill, NY 12533 USA

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXV, PT 1 AND PT 2 | 2011年 / 7971卷

关键词：

scatterometry; angle of incidence; dispersion; material characterization; optical properties; critical dimension; TMU; dynamic repeatability; sensitivity of measurement;

D O I：

10.1117/12.881638

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Improvement in metrology performance when using a combination of multiple optical channels vs. standard single optical channel is studied. Two standard applications (gate etch 4x and STI etch 2x) are investigated theoretically and experimentally. The results show that while individual channels might have increased performance for few individual parameters each-it is the combination of channels that provides the best overall performance for all parameters.

引用

页数：8

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