Thin Film Solar Cell Based on ZnSnN2/SnO Heterojunction

被引:44
作者
Javaid, Kashif [1 ,2 ,3 ]
Yu, Jingjing [1 ]
Wu, Weihua [1 ]
Wang, Jun [4 ]
Zhang, Hongliang [1 ]
Gao, Junhua [1 ]
Fei Zhuge [1 ]
Liang, Lingyan [1 ,5 ]
Cao, Hongtao [1 ]
机构
[1] Chinese Acad Sci, Key Lab Graphene Technol & Applicat, NIMTE, Ningbo 315201, Zhejiang, Peoples R China
[2] Univ Faisalabad, Govt Coll, Dept Phys, Allama Iqbal Rd, Faisalabad 38000, Pakistan
[3] Univ Chinese Acad Sci, Int Sch, Beijing 100049, Peoples R China
[4] Ningbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
[5] Chinese Acad Sci, Key Lab Semicond Mat Sci, Beijing Key Lab Low Dimens Semicond Mat & Devices, Inst Semicond, Beijing 100083, Peoples R China
来源
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | 2018年 / 12卷 / 01期
基金
中国国家自然科学基金;
关键词
carrier injection/extraction; electrode selectivity; energy band alignment; heterojunction solar cells; ZnSnN2 thin films; OXIDE; FABRICATION; PRINCIPLES; INSIGHTS;
D O I
10.1002/pssr.201700332
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this article, we report the growth of zinc-tin nitride (ZnSnN2) thin films as a potential absorber for photovoltaic applications by fabricating a heterojunction of n-ZnSnN2/p-SnO. The performance of the heterojunction has been monitored through selective deposition of top electrode with different materials (Ni/Au or Al). The electron-transfer process from the ZnSnN2 layer to the cathode is facilitated by selecting metal electrode with relatively low work function, which also boosts up the electron injection or/and extraction. The diode exhibits a good J-V response in the dark with a rectification ratio of 3x10(3) at 1.0V and an ideality factor of 4.2 in particular with Al as the top electrode. Under illumination, the heterostructure solar cell demonstrates a power conversion efficiency of approximate to 0.37% with an open circuit voltage of 0.25V and a short circuit current density of 4.16mAcm(-2). The prime strategies, on how to improve solar cell efficiency concerning band offsets and band alignment engineering are also discussed.
引用
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页数:7
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