Alignment of liquid crystal by patterned isotropic surfaces
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作者:
Lee, BW
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Samsung Elect Corp, AMLCD Div, Basic Res Team Gyeonggi Do, Nongseo Ri, South KoreaSamsung Elect Corp, AMLCD Div, Basic Res Team Gyeonggi Do, Nongseo Ri, South Korea
Lee, BW
[1
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Sagong, D
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Samsung Elect Corp, AMLCD Div, Basic Res Team Gyeonggi Do, Nongseo Ri, South KoreaSamsung Elect Corp, AMLCD Div, Basic Res Team Gyeonggi Do, Nongseo Ri, South Korea
Sagong, D
[1
]
机构:
[1] Samsung Elect Corp, AMLCD Div, Basic Res Team Gyeonggi Do, Nongseo Ri, South Korea
Alignment of Liquid Crystals (LCs) has been mostly achieved by microscopically anisotropic surfaces, It is widely believed that anisotropic van der Waals interaction is responsible for the alignment of LCs. We report that isotropic surfaces can align LCs as well when patterned topologically, chemically, and electrically. Stripe-patterned surfaces were produced by photolithography, having periodicity of several microns. The surfaces have either undulation (high and low, topological), alternating polar easy axes (planar and homeotropic, chemical), or alternating conductivity (conducting and non-conducting, electrical). LCs were aligned perpendicularly to the electrical pattern, in contrast to the topological and chemical patterns to which LCs were aligned tangentially. Topologically patterned isotropic surfaces align LCs by the well-known Berreman mechanism. In this report, it is analytically shown that elastic anisotropy and flexoelectricity are responsible for the azimuthal anchoring of LCs on the chemically and electrically patterned surfaces, respectively.
机构:
Univ Colorado, Dept Phys, Ferroelect Liquid Crystal Mat Res Ctr, Boulder, CO 80309 USAUniv Colorado, Dept Phys, Ferroelect Liquid Crystal Mat Res Ctr, Boulder, CO 80309 USA
Lee, BW
Clark, NA
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Univ Colorado, Dept Phys, Ferroelect Liquid Crystal Mat Res Ctr, Boulder, CO 80309 USAUniv Colorado, Dept Phys, Ferroelect Liquid Crystal Mat Res Ctr, Boulder, CO 80309 USA
机构:
Univ Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Bramble, Jonathan P.
Tate, Daniel J.
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Univ Leeds, Sch Chem, Ctr Mol Nanosci, Leeds LS2 9JT, W Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Tate, Daniel J.
Revill, Derek J.
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Univ Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Revill, Derek J.
Sheikh, Khizar H.
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Univ Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Sheikh, Khizar H.
Henderson, James R.
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Univ Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Henderson, James R.
Liu, Feng
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Univ Sheffield, Dept Mat Engn, Sheffield S1 3JD, S Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Liu, Feng
Zeng, Xiangbing
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Univ Sheffield, Dept Mat Engn, Sheffield S1 3JD, S Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Zeng, Xiangbing
Ungar, Goran
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Univ Sheffield, Dept Mat Engn, Sheffield S1 3JD, S Yorkshire, England
Seoul Natl Univ, WCU Chem Convergence Energy & Environm, Seoul 151744, South KoreaUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Ungar, Goran
Bushby, Richard J.
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Univ Leeds, Sch Chem, Ctr Mol Nanosci, Leeds LS2 9JT, W Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England
Bushby, Richard J.
Evans, Stephen D.
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Univ Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, EnglandUniv Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England