Effect of back-surface roughness of sapphire substrate on growth of GaN thin films

被引:4
作者
Aida, Hideo [1 ]
Kim, Seong-woo [1 ]
Suzuki, Toshimasa [2 ]
机构
[1] Namiki Precis Jewel Co Ltd, Adachi Ku, 3-8-22 Shinden, Tokyo 1238511, Japan
[2] Nippon Inst Technol, 4-1 Gakuendai, Saitama 3458501, Japan
来源
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY | 2017年 / 50卷
关键词
SaPphire substrate; Bowing; GaN epitaxy; X-ray rocking curve; CONTROLLED PROFILE CRYSTALS; MELT;
D O I
10.1016/j.precisioneng.2017.05.001
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The change in the full width at half maximum (FWHM) of the X-ray diffraction rocking curve of sapphire (0006) reflections as a function of the slit-width of the incident X-rays was measured for GaN-on-sapphire substrates at elevated temperatures from 25 to 800 degrees C to study the effect of back-surface roughness of sapphire substrate on the bowing behavior of GaN-on-sapphire substrates at elevated temperature. The extent of bowing of the GaN-on-sapphire substrate was estimated by determining the rocking curve broadening effect from the measured FWHMs, because the rocking curve will be broadened if the crystal has curvature in its physical shape. It was found that the GaN-on-sapphire substrate was typically bowed in the convex direction at room temperature, and this convex bowing was reduced and became flat and then concave with increasing temperature. The clear difference in the temperature at which the GaN-on-sapphire substrate became flat was shown as a function of the back-surface roughness of the sapphire substrates. The back-surface roughness of the sapphire substrate has been suggested to have a direct impact on the uniformity of the LED wavelength across the substrate diameter. (C) 2017 Published by Elsevier Inc.
引用
收藏
页码:142 / 147
页数:6
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