Ultra-sensitive Hall sensors based on graphene encapsulated in hexagonal boron nitride

被引:97
作者
Dauber, Jan [1 ,2 ,3 ]
Sagade, Abhay A. [4 ]
Oellers, Martin [1 ,2 ]
Watanabe, Kenji [5 ]
Taniguchi, Takashi [5 ]
Neumaier, Daniel [4 ]
Stampfer, Christoph [1 ,2 ,3 ]
机构
[1] Rhein Westfal TH Aachen, JARA FIT, D-52074 Aachen, Germany
[2] Rhein Westfal TH Aachen, Inst Phys 2, D-52074 Aachen, Germany
[3] Forschungszentrum Julich, Peter Grunberg Inst PGI 8 9, D-52425 Julich, Germany
[4] AMO GmbH, Adv Microelect Ctr Aachen AMICA, D-52074 Aachen, Germany
[5] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
关键词
DEVICES;
D O I
10.1063/1.4919897
中图分类号
O59 [应用物理学];
学科分类号
摘要
The encapsulation of graphene in hexagonal boron nitride provides graphene on substrate with excellent material quality. Here, we present the fabrication and characterization of Hall sensor elements based on graphene boron nitride heterostructures, where we gain from high mobility and low charge carrier density at room temperature. We show a detailed device characterization including Hall effect measurements under vacuum and ambient conditions. We achieve a current-and voltage-related sensitivity of up to 5700 V/AT and 3 V/VT, respectively, outpacing state-of-the-art silicon and III/V Hall sensor devices. Finally, we extract a magnetic resolution limited by low frequency electric noise of less than 50 nT/root Hz making our graphene sensors highly interesting for industrial applications. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:4
相关论文
共 21 条
[1]  
[Anonymous], 2014, MAGNETIC FIELDS SENS
[2]   High sensitivity and multifunctional micro-Hall sensors fabricated using InAlSb/InAsSb/InAlSb heterostructures [J].
Bando, M. ;
Ohashi, T. ;
Dede, M. ;
Akram, R. ;
Oral, A. ;
Park, S. Y. ;
Shibasaki, I. ;
Handa, H. ;
Sandhu, A. .
JOURNAL OF APPLIED PHYSICS, 2009, 105 (07)
[3]   High quality Hall sensors made of heavily doped n-InSb epitaxial films [J].
Berus, T ;
Oszwaldowski, M ;
Grabowski, J .
SENSORS AND ACTUATORS A-PHYSICAL, 2004, 116 (01) :75-78
[4]   Micro-Hall devices: performance, technologies and applications [J].
Boero, G ;
Demierre, M ;
Besse, PA ;
Popovic, RS .
SENSORS AND ACTUATORS A-PHYSICAL, 2003, 106 (1-3) :314-320
[5]   Random Strain Fluctuations as Dominant Disorder Source for High-Quality On-Substrate Graphene Devices [J].
Couto, Nuno J. G. ;
Costanzo, Davide ;
Engels, Stephan ;
Ki, Dong-Keun ;
Watanabe, Kenji ;
Taniguchi, Takashi ;
Stampfer, Christoph ;
Guinea, Francisco ;
Morpurgo, Alberto F. .
PHYSICAL REVIEW X, 2014, 4 (04)
[6]   The rise of graphene [J].
Geim, A. K. ;
Novoselov, K. S. .
NATURE MATERIALS, 2007, 6 (03) :183-191
[7]   Spatially resolved raman spectroscopy of single- and few-layer graphene [J].
Graf, D. ;
Molitor, F. ;
Ensslin, K. ;
Stampfer, C. ;
Jungen, A. ;
Hierold, C. ;
Wirtz, L. .
NANO LETTERS, 2007, 7 (02) :238-242
[8]   HIGHLY LINEAR GAAS HALL DEVICES FABRICATED BY ION-IMPLANTATION [J].
HARA, T ;
MIHARA, M ;
TOYODA, N ;
ZAMA, M .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (01) :78-82
[9]   SOLID-STATE MAGNETIC-FIELD SENSORS AND APPLICATIONS [J].
HEREMANS, J .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1993, 26 (08) :1149-1168
[10]   Graphene/Si CMOS Hybrid Hall Integrated Circuits [J].
Huang, Le ;
Xu, Huilong ;
Zhang, Zhiyong ;
Chen, Chengying ;
Jiang, Jianhua ;
Ma, Xiaomeng ;
Chen, Bingyan ;
Li, Zishen ;
Zhong, Hua ;
Peng, Lian-Mao .
SCIENTIFIC REPORTS, 2014, 4