Weak pinning: surface growth in the presence of a defect

被引:9
作者
Slanina, F
Kotrla, M
机构
[1] Acad Sci Czech Republ, Inst Phys, CZ-18040 Prague, Czech Republic
[2] Ctr Theoret Study, CZ-11000 Praha, Czech Republic
来源
PHYSICA A | 1998年 / 256卷 / 1-2期
关键词
growth; asymmetric exclusion model; pinning;
D O I
10.1016/S0378-4371(98)00203-9
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We study the influence of a point defect on the profile of a growing surface in the single-step growth model. We employ the mapping to the asymmetric exclusion model with blockage, and using Bethe-ansatz eigenfunctions as a starting approximation we are able to solve this problem analytically in two-particle sector. The dip caused by the defect is computed. A simple renormalization group-like argument enables to study scaling of the dip with increasing length of the sample L. For a horizontal surface we found that the surface is only weakly pinned at the inhomogeneity; the dip scales as a powerlaw L-gamma with gamma = 0.58496. The value of the exponent agrees with direct numerical simulations of the inhomogeneous single-step growth model. In the case of tilted surfaces we observe a phase transition between weak and strong pinning and the exponent in the weak pinning regime depends on the tilt. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1 / 17
页数:17
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