Phonon density of states of pseudomorphic fcc-Fe film

被引：5
作者：
Tanaka, T
Tajima, A
Moriizumi, R
Oshima, C
Tsunoda, Y
Seto, M
Kitao, S
Mitsui, T
机构：
[1] Waseda Univ, Kagami Mem Lab Mat Sci & Technol, Tokyo 1690051, Japan
[2] Waseda Univ, Dept Appl Phys, Tokyo 1698555, Japan
[3] Kyoto Univ, Inst Res Reactor, Osaka 5900494, Japan
[4] Japan Atom Energy Res Inst, Sayo, Hyogo 6795198, Japan
来源：
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 2005年 / 74卷 / 06期
关键词：
phonon density of states; fcc-Fe thin film; nuclear resonant inelastic scattering; hexagonal boron nitride (h-BN);
D O I：
10.1143/JPSJ.74.1762
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
The phonon density of states of a pseudomorphic fcc-Fe film with similar to 3 monolayers has been investigated by nuclear resonant inelastic scattering. The fcc-Fe layers are intercalated into an interface between monolayer hexagonal boron nitride and a Ni(111) substrate with a commensurate relation. The in-plane nearest-neighbor distance of the fcc-Fe film is shorter than that of uncompressed fcc-Fe precipitates in Cu by -1.8%. The compression increases the mean force constant of the fcc-Fe film, which is higher than that of uncompressed fcc-Fe precipitates by 5.8%.
引用
收藏
页码：1762 / 1765
页数：4
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