Silicon-based light emitting devices

被引:21
作者
Lourenço, MA
Milosavljevic, M
Galata, S
Siddiqui, MSA
Shao, G
Gwilliam, RM
Homewood, KP
机构
[1] Univ Surrey, Adv Technol Inst, Sch Elect & Phys Sci, Guildford GU2 7XH, Surrey, England
[2] Univ Surrey, Sch Engn, Guildford GU2 7XH, Surrey, England
基金
英国工程与自然科学研究理事会;
关键词
silicon; electroluminescence; dislocation engineering; light emitting devices;
D O I
10.1016/j.vacuum.2005.01.085
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We describe here a new technology, dislocation engineering, and in particular how this approach, when incorporated appropriately in to a p-n junction, can add the new functionality of efficient electroluminescence at room temperature from silicon-based light emitting devices. Simple (undoped) silicon devices emit at 1. 15 mu m, at the Si band gap energy. In this paper, we show how emission at other wavelengths, such as 1.3 and 1.5 mu m, can be achieved by doping a standard dislocation engineered light emitting device with an appropriate optical centre, such as sulphur and erbium. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码:551 / 556
页数:6
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