Structural and optical characterization of MOCVD-grown ZnO thin films

被引：8

作者：

Pagni, O ^{[1
]}

James, GR ^{[1
]}

Leitch, AWR ^{[1
]}

机构：

[1] Univ Port Elizabeth, Dept Phys, ZA-6000 Port Elizabeth, South Africa

来源：

11TH INTERNATIONAL CONFERENCE ON II-VI COMPOUNDS (II-VI 2003), PROCEEDINGS | 2004年 / 1卷 / 04期

关键词：

D O I：

10.1002/pssc.200304144

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on the characterization of ZnO thin films grown by metal organic chemical vapor deposition (MOCVD) using diethyl zinc (DEZ) and tert-butanol (TBOH) as precursors. Substrate temperature proved to be a crucial factor in the crystallization process, as it vastly impacted the structural properties of the samples studied. Highly c-axis oriented films with large grain size (52 nm), low tensile strain (0.6%), uniform substrate coverage and a columnar structure devoid of hexagonal needles were successfully deposited on n-Si (100) substrates. The temperature-dependent luminescence spectra recorded confirmed the excellent quality of the material obtained in this work. Our results so far set TBOH apart as an outstanding oxygen source for the MOCVD growth of ZnO. (C) 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：864 / 867

页数：4

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