Cellular Automata Modeling on Corrosion of Metal with Line Defects

被引:1
作者
Wang, Haitao [1 ]
Han, En-Hou [1 ]
机构
[1] Chinese Acad Sci, Inst Met Res, Key Lab Nucl Mat & Safety Assessment, Shenyang 110016, Peoples R China
关键词
cellular automata; corrosion; film growth; diffusion; line defects; DIFFUSION; SIMULATIONS; BEHAVIOR; GROWTH; FILMS;
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The formation mechanism of corrosion films on a metal surface with the line defects is studied using a cellular automata approach. To represent the line defects in the model, the regularly spaced columns of metal sites are introduced. These columns are characterized by a corrosion probability higher than that of bulk metal sites. The results show that the influence of defect density on corrosion and film growth can be divided into two stages, and the transition value for the defect density is given. The structural evolution of the film is also investigated by the diffusing species distribution.
引用
收藏
页码:815 / 822
页数:8
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