Nanofabrication by scanning probe microscope lithography: A review

被引:337
作者
Tseng, AA
Notargiacomo, A
Chen, TP
机构
[1] Arizona State Univ, Dept Mech & Aerosp Engn, Tempe, AZ 85287 USA
[2] Roma TRE Univ, Dept Phys, I-00146 Rome, Italy
[3] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2005年 / 23卷 / 03期
基金
美国国家科学基金会;
关键词
D O I
10.1116/1.1926293
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In addition to its well-known capabilities in imaging and spectroscopy, scanning probe microscopy (SPM) has recently shown great potentials for patterning of material structures in nanoscales. It has drawn the attention of not only the scientific community, but also the industry. This article examines various applications of SPM in modification, deposition, removal, and manipulation of materials for nanoscale fabrication. The SPM-based nanofabrication involves two basic technologies: scanning tunneling microscopy and atomic force microscopy. Major techniques related to these two technologies are evaluated with emphasis on their abilities, efficiencies, and reliabilities to make nanostructures. The principle and specific approach underlying each technique are presented; the differences and uniqueness among these techniques are subsequently discussed. Finally, concluding remarks are provided where the strength and weakness of the techniques studied are summarized and the scopes for technology improvement and future research are recommended. (c) 2005 American Vacuum Society.
引用
收藏
页码:877 / 894
页数:18
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