Pt-Pd-embedded silicon microwell arrays

被引：21

作者：

Asoh, Hidetaka ^{[1
]}

Arai, Fusao ^{[1
]}

Uchibori, Kota ^{[1
]}

Ono, Sachiko ^{[1
]}

机构：

[1] Kogakuin Univ, Dept Appl Chem, Tokyo 1920015, Japan

来源：

APPLIED PHYSICS EXPRESS | 2008年 / 1卷 / 06期

关键词：

D O I：

10.1143/APEX.1.067003

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Si microwell arrays containing Pt-Pd thin film were fabricated by the chemical etching of a Si substrate through a polystyrene honeycomb mask using a patterned metal catalyst. The honeycomb mask, which was formed by the utilization of binary colloidal crystals composed of large silica spheres and small polystyrene spheres, acted as a mask for metal deposition. After immersing a locally Pt-Pd-coated Si substrate into a solution containing hydrofluoric acid and hydrogen peroxide, an ordered Si microwell array with a hexagonal arrangement could be obtained by site-selective metal-assisted chemical etching. Moreover, the notable feature of this process is that an isolated circular Pt-Pd film used as a catalyst remained at the bottom of each well after chemical etching. (C) 2008 The Japan Society of Applied Physics.

引用

页码：0670031 / 0670033

页数：3

共 15 条

[1] Site-selective chemical etching of silicon using patterned silver catalyst [J].