Roughening transition of Si(hhm) surface with m/h=1.4-1.5 studied by UHV-REM

被引：0
|
作者：
Suzuki, T [1 ]
Yagi, K [1 ]
机构：
[1] TOKYO INST TECHNOL,DEPT PHYS,TOKYO 152,JAPAN
来源：
SURFACES, VACUUM, AND THEIR APPLICATIONS | 1996年 / 378期
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D O I：
暂无
中图分类号：
O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号：
070203 ; 070304 ; 081704 ; 1406 ;
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页码：1 / 7
页数：7
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