The effect of growth potential on the self-discharge behavior of Cu-Ni based alloy electrodes

被引:4
作者
Yavuz, Abdulcabbar [1 ]
Artan, Murat [2 ]
Yilmaz, Necip Fazil [2 ,3 ]
机构
[1] Gaziantep Univ, Dept Met & Mat Engn, TR-27310 Gaziantep, Sehitkamil, Turkey
[2] Gaziantep Univ, Dept Mech Engn, TR-27310 Gaziantep, Sehitkamil, Turkey
[3] Hasan Kalyoncu Univ, Board Trustees, TR-27010 Gaziantep, Turkey
关键词
Metaloxide; Supercapacitor; Ionicliquid; Graphite; Alloys; Self-discharge; REDUCED GRAPHENE OXIDE; HIGH-PERFORMANCE; COPPER ELECTRODEPOSITION; SURFACE-MORPHOLOGY; ELECTROCHEMICAL DEPOSITION; ACTIVATED CARBON; ENERGY-STORAGE; SUPERCAPACITOR; FABRICATION; MECHANISMS;
D O I
10.1016/j.jpcs.2022.110872
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Recently, the increasing demand for sustainable clean energy from non-fossil sources motivated the researchers in energy storage devices and supercapacitors are one of the most promising energy storage systems. In this study, flexible copper and nickel coated electrodes are fabricated for supercapacitor applications from Ethaline deep eutectic solvent media. Copper and nickel-based materials were potentiostatically electrodeposited on flexible graphite substrates from Ethaline ionic liquid containing copper and nickel ions. Cu-Ni coated graphite films were scanned in 1 M KOH from -0.7 V to 0.4 V at different scan rates ranging between 5 mV s-1 and 100 mV s-1. Fabricated Cu-Ni electrodes were characterized by scanning electron microscopy (SEM), Fourier transform infrared spectroscopy (FTIR) and X-ray diffraction (XRD). Copper and nickel formation ratios on graphite films at different deposition voltages were determined by EDX analysis. Cu-Ni coated graphite films applying -1.8 V deposition potential exhibited a maximum areal capacitance of 47.3 mF cm-2 at 5 mV s-1 scan rate. Galvanostatic charge-discharge curves of the electrodes obtained at different applied voltages confirms the supercapacitor behaviour of Cu-Ni coated films. One of the biggest issues regarding the use of supercapacitors in daily life is their self-discharge behaviour. Self-discharge curves of the Cu-Ni modified electrodes were illustrated that decreasing deposition potentials can decrease self-discharge problem. This research determines that Ethaline ionic liquid is a potential media for alloy-based electrodes in the usage of supercapacitor applications.
引用
收藏
页数:9
相关论文
共 105 条
[1]   Electrodeposition of nickel using eutectic based ionic liquids [J].
Abbott, A. P. ;
El Ttaib, K. ;
Ryder, K. S. ;
Smith, E. L. .
TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 2008, 86 (04) :234-240
[2]   Novel lead dioxide intercalated polypyrrole/graphene oxide ternary composite for high throughput supercapacitors [J].
Abraham, Sibi ;
Prasankumar, T. ;
Kumar, K. Vinoth ;
Karazhanov, Smagul Zh ;
Jose, Sujin .
MATERIALS LETTERS, 2020, 273
[3]   Enhanced Electrochemical Performance of Cr-doped NiO Nanorods for Supercapacitor Application [J].
Ahmed, Rizwan ;
Nabi, Ghulam .
JOURNAL OF ENERGY STORAGE, 2021, 33 (33)
[4]   Stable high-voltage aqueous pseudocapacitive energy storage device with slow self-discharge [J].
Avireddy, Hemesh ;
Byles, Bryan W. ;
Pinto, David ;
Delgado Galindo, Jose Miguel ;
Jacas Biendicho, Jordi ;
Wan, Xuehang ;
Flox, Cristina ;
Crosnier, Olivier ;
Brousse, Thierry ;
Pomerantseva, Ekaterina ;
Morante, Joan Ramon ;
Gogotsi, Yury .
NANO ENERGY, 2019, 64
[5]   Facile synthesis of a copper oxide/molybdenum disulfide heterostructure for asymmetric supercapacitors of high specific energy [J].
Awasthi, Ganesh Prasad ;
Poudel, Milan Babu ;
Shin, Miyeon ;
Sharma, Krishna Prasad ;
Kim, Han Joo ;
Yu, Changho .
JOURNAL OF ENERGY STORAGE, 2021, 42
[6]   MXene-Copper/Cobalt Hybrids via Lewis Acidic Molten Salts Etching for High Performance Symmetric Supercapacitors [J].
Bai, Yang ;
Liu, Chunli ;
Chen, Tingting ;
Li, Wenting ;
Zheng, Shasha ;
Pi, Yecan ;
Luo, Yongsong ;
Pang, Huan .
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2021, 60 (48) :25318-25322
[7]  
Ban FY, 2012, INT J ELECTROCHEM SC, V7, P4345
[8]   ENVIRONMENTAL-DAMAGE DUE TO FOSSIL-FUELS USE [J].
BARBIR, F ;
VEZIROGLU, TN ;
PLASS, HJ .
INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 1990, 15 (10) :739-749
[9]   Copper electrodeposition from a chloride free deep eutectic solvent [J].
Bernasconi, Roberto ;
Zebarjadi, Mandana ;
Magagnin, Luca .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 2015, 758 :163-169
[10]   Study of the Nucleation and Growth Mechanisms in the Electrodeposition of Micro- and Nanostructured Cu2O Thin Films [J].
Bijani, S. ;
Schrebler, R. ;
Dalchiele, E. A. ;
Gabas, M. ;
Martinez, L. ;
Ramos-Barrado, J. R. .
JOURNAL OF PHYSICAL CHEMISTRY C, 2011, 115 (43) :21373-21382