Performance enhancement of GaN ultraviolet avalanche photodiodes with p-type δ-doping

被引:40
作者
Bayram, C. [1 ]
Pau, J. L. [1 ]
McClintock, R. [1 ]
Razeghi, M. [1 ]
机构
[1] Northwestern Univ, Ctr Quantum Devices, Dept Elect Engn & Comp Sci, Evanston, IL 60208 USA
关键词
D O I
10.1063/1.2948857
中图分类号
O59 [应用物理学];
学科分类号
摘要
High quality delta-doped p-GaN is used as a means of improving the performance of back-illuminated GaN avalanche photodiodes (APDs). Devices with delta-doped p-GaN show consistently lower leakage current and lower breakdown voltage than those with bulk p-GaN. APDs with delta-doped p-GaN also achieve a maximum multiplication gain of 5.1x10(4), more than 50 times higher than that obtained in devices with bulk p-GaN. The better device performance of APDs with delta-doped p-GaN is attributed to the higher structural quality of the p-GaN layer achieved via delta-doping.
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页数:3
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