Paradoxes related to electron-hole scattering in junction structures

被引:7
|
作者
Mnatsakanov, TT
Levinshtein, ME
Tandoev, AG
Yurkov, SN
Palmour, JW
机构
[1] All Russia Electrotech Inst, Moscow 111250, Russia
[2] AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[3] Cree Inc, Durham, NC 27703 USA
基金
俄罗斯基础研究基金会;
关键词
D O I
10.1063/1.1897839
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electron-hole scattering (EHS) affects the operation of all bipolar semiconductor devices at a high current density. From a physical point of view, EHS has always been considered an additional "frictional mechanism" for free carriers. Because any friction is a dissipative process, the main conclusion of numerous studies devoted to EHS is that the EHS increases the forward voltage drop across semiconductor devices. As a consequence, the inclusion of EHS inevitably raises the energy loss in bipolar devices. It is shown in this paper that EHS leads to a decrease in the forward voltage drop across bipolar devices in some important cases. This decrease may be substantial from a practical point of view. (c) 2005 American Institute of Physics.
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