Subwavelength-engineered metamaterial devices for integrated photonics

The engineering of subwavelength grating metamaterials has become an essential design strategy in silicon photonics. The lithographic segmentation of integrated waveguides at the subwavelength scale enables the synthesis of on-chip metamaterials and provides control over optical properties such as mode delocalization, wavelength dispersion, and anisotropy. At the near-infrared wavelengths of the 1.55-mu m telecom band, a range of subwavelength-based devices with unprecedented performance has been demonstrated, including couplers, filters, and polarization-handling structures. In this invited paper, we review the foundations of anisotropic subwavelength grating metamaterials and discuss our latest advances in five new subwavelength-enhanced devices: a millimeter-long optical antenna that is evanescently coupled to diffractive lateral segments, thereby achieving a record far-field beam width of 0.1 degrees in silicon; a multi-line integrated Bragg filter also using lateral loading segments, which produces 20 non-uniformly spaced spectral notches with a 3-dB linewidth as low as 210 pm; a low-loss curved wavelength demultiplexer; a segmented multi-mode interference coupler based on novel bricked subwavelength gratings, yielding a 1-dB bandwidth exceeding 140 nm; and a suspended waveguide platform with low propagation loss at mid-infrared wavelengths.