Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature

被引：11

作者：

Liu Baoting ^{[1
]}

Zhou Yang ^{[1
]}

Zheng Hongfang ^{[2
]}

Li Man ^{[1
]}

Guo Zhe ^{[1
]}

Zhao Qingxun ^{[1
]}

Peng Yingcai ^{[3
]}

机构：

[1] Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Peoples R China

[2] Baoding Univ, Baoding 071000, Peoples R China

[3] Hebei Univ, Coll Elect & Informat Engn, Baoding 071002, Peoples R China

来源：

RARE METALS | 2011年 / 30卷 / 02期

基金：

高等学校博士学科点专项科研基金; 中国国家自然科学基金;

关键词：

thin films; zinc oxide; magnetron sputtering; oxygen; structural properties; optical properties; GROWTH;

D O I：

10.1007/s12598-011-0219-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Zinc oxide (ZnO) thin films were deposited on sapphire (0001) substrates at room temperature by radiofrequency (RF) magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro-photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance (>90%) in the visible-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtering by energetic oxygen anions in the growing process.

引用

页码：170 / 174

页数：5

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