Spatially inhomogeneous development of antiferromagnetism in URu2Si2:: Evidence from 29Si NMR under pressure -: art. no. 087203

被引：149

作者：

Matsuda, K

Kohori, Y

Kohara, T

Kuwahara, K ^{[1
]}

Amitsuka, H

机构：

[1] Himeji Inst Technol, Dept Mat Sci, Kamigori, Hyogo 6781297, Japan

[2] Hokkaido Univ, Grad Sch Sci, Div Phys, Sapporo, Hokkaido 0600810, Japan

来源：

PHYSICAL REVIEW LETTERS | 2001年 / 87卷 / 08期

关键词：

D O I：

10.1103/PhysRevLett.87.087203

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

From Si-29 NMR study, we present evidence for spatially inhomogeneous development of antiferromagnetic (AF) ordering below T-o = 17.5 K in URu2Si2. In the pressure range between 3.0 and 8.3 kbar. we have observed the Si-29 NMR lines arising from the AF region as well as the previously observed Si-29 NMR line which correspond to the nonmagnetic region in the sample. The AF volume fraction is enhanced by applied pressure, whereas the magnitude of internal field at the Si site remains constant (910 Oe) up to 8.3 kbar. In the AF region, the ordered moment is about an order of magnitude larger than 0.03 mu (B)/U.

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页码：87203 / 1

页数：4

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