The stability and surface termination of hexagonal LuFeO3

被引:14
作者
Cao, Shi [1 ]
Paudel, Tula R. [1 ]
Sinha, Kishan [1 ]
Jiang, Xuanyuan [1 ]
Wang, Wenbin [2 ]
Tsymbal, Evgeny Y. [1 ]
Xu, Xiaoshan [1 ]
Dowben, Peter A. [1 ]
机构
[1] Univ Nebraska, Dept Phys & Astron, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USA
[2] Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
基金
美国国家科学基金会;
关键词
lutetium ferrite; multiferroic/magnetoelectric films; density functional theory; x-ray photoemission; X-RAY PHOTOELECTRON; OXIDE-FILMS; ELECTRONIC-STRUCTURE; MULTIPLET STRUCTURE; AUGER-ELECTRON; XPS SPECTRA; SCATTERING; APPROXIMATION; PHOTOEMISSION; PEROVSKITE;
D O I
10.1088/0953-8984/27/17/175004
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The surface termination and the nominal valence states for hexagonal LuFeO3 thin films grown on Al2O3(0 0 0 1) substrates were characterized by angle resolved x-ray photoemission spectroscopy. The Lu 4f, Fe 2p and O 1s core level spectra indicate that both the surface termination and the nominal valence depend on surface preparation, but the stable surface terminates in a Fe-O layer. This is consistent with the results of density functional calculations which predict that the Fe-O termination of LuFeO3(0 0 0 1) surface is energetically favorable and stable over a broad range of temperatures and oxygen partial pressures when it is reconstructed to eliminate surface polarity.
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页数:7
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