PROBING SINGLE AND BILAYER GRAPHENE FIELD EFFECT TRANSISTORS BY RAMAN SPECTROSCOPY

被引:12
|
作者
Das, A. . [1 ]
Chakraborty, B. [1 ]
Sood, A. K. [1 ]
机构
[1] Indian Inst Sci, Dept Phys, Bangalore 560012, Karnataka, India
来源
MODERN PHYSICS LETTERS B | 2011年 / 25卷 / 08期
关键词
Single layer graphene; bilayer graphene; phonons; Raman spectroscopy; electron-phonon coupling; graphene field effect transistor; electrochemical doping; ELECTRONIC-STRUCTURE; CHARGE-TRANSFER; GRAPHITE; SCATTERING; LAYER; PHONONS; GAS;
D O I
10.1142/S0217984911025973
中图分类号
O59 [应用物理学];
学科分类号
摘要
This article is a review of our work related to Raman studies of single layer and bilayer graphenes as a function Fermi level shift achieved by electrochemically top gating a field effect transistor. Combining the transport and in situ Raman studies of the field effect devices, a quantitative understanding is obtained of the phonon renormalization due to doping of graphene. Results are discussed in the light of time dependent perturbation theory, with electron phonon coupling parameter as an input from the density functional theory. It is seen that phonons near and Gamma and K points of the Brillouin zone are renormalized very differently by doping. Further, Gamma-phonon renormalization is different in bilayer graphene as compared to single layer, originating from their different electronic band structures near the zone boundary K-point. Thus Raman spectroscopy is not only a powerful probe to characterize the number of layers and their quality in a graphene sample, but also to quantitatively evaluate electron phonon coupling required to understand the performance of graphene devices.
引用
收藏
页码:511 / 535
页数:25
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