Oxide formation on Si(100)-2x1 surfaces studied by scanning tunneling microscopy scanning tunneling spectroscopy

The oxide formation on Si(100)-2x1 surfaces at room temperature has been studied by scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). The change in electronic structures due to oxidation has been discussed based on the spatially resolved STS spectra. It was found in the initial stage of oxidation that the local density-of-states (LDOS) of back bond states and dangling bond sites decreases dramatically at the oxidation-induced bright protrusions. The STS spectra of the 2x1 region with an oxygen exposure of 4.5 L suggest that oxygen atoms adsorb on the back bond sites. At the average SiO2 thickness of 0. 2, nm, the surface states of Si(100)-2 x 1 vanish completely and the energy width of the gap near the Fermi level becomes very close to the band gap of bulk Si. In addition, the observed LDOS is spatially uniform in spite of the presence of bumps in the STM image. The STS spectra indicate the formation of the valence band and the conduction band of SiO2 at the oxide thickness of 0.4 nm.