Effect of metal type on the contacts to n-type and p-type GaN

被引:10
作者
Rennie, J
Onomura, M
Nunoue, S
Hatakoshi, G
Sugawara, H
Ishikawa, M
机构
[1] Toshiba Corp, Adv Semicond Devices Labs, Saiwai Ku, Kawasaki, Kanagawa 210, Japan
[2] Toshiba Corp, Optoelect Semicond Engn Dept, Saiwai Ku, Kawasaki, Kanagawa 210, Japan
关键词
GaN; Fermi level pinning; Schottky barriers; metal contacts;
D O I
10.1016/S0022-0248(98)00267-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The electrical properties of various metal contacts to both n-type and p-type GaN were investigated to determine the underlying trend between the metallic contact workfunction and the resultant Schottky barrier height between the said contact and the GaN material. It is concluded that, contrary to the expected trend, Fermi level pinning is not only present but is quite strong, with the effect being greater in the p-type material. The S factor (:the index of interface behaviour) was seen to be reduced from 1.00 to 0.21 and 0.01 for n and p-type GaN, respectively. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:711 / 715
页数:5
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