Use of an indium zinc oxide interlayer for forming Ag-based Ohmic contacts to p-type GaN for UV-light-emitting diodes

被引:7
作者
Ban, KY [1 ]
Hong, HG
Noh, DY
Seong, TY
Song, JO
Kim, D
机构
[1] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
[2] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[3] Korea Univ, Div Mat Sci & Engn, Seoul 136701, South Korea
关键词
D O I
10.1088/0268-1242/20/9/006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated indium-doped ZnO(IZO)/Ag Ohmic contacts to p-type GaN for use in UV-light-emitting diodes (LEDs). The as-deposited sample shows rectifying behaviour. However, the samples become Ohmic when annealed at temperature of 330-530 degrees C for 1 min in air. For example, the contact produces specific contact resistance of 5.51 X 10(-4) Omega cm(2) upon annealing at 530 degrees C. In addition, the 530 degrees C annealed IZO/Ag contacts give reflectance of 82.3% at a wavelength of 405 nm, which is better than that (70.6%) of the single Ag contacts. Near-UV LEDs fabricated with the IZO/Ag contacts give forward voltage of 3.24 V at an injection current of 20 mA, which is better than that with the single Ag contacts. On the basis of x-ray photoemission spectroscopy and scanning transmission electron microscopy results, possible Ohmic formation mechanisms are described.
引用
收藏
页码:921 / 924
页数:4
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