LCD glass cleaning by atmospheric pressure glow discharge plasma

被引:4
作者
Cho, JH
Kim, JW
Kim, KS
Lee, WY
Kim, SH
Choi, WY
机构
[1] Changjo Engn Co Ltd, Hwaseong, South Korea
[2] Korea Univ Tech & Educ, Cheonan, South Korea
[3] Kangnung Natl Univ, Kangnung, South Korea
来源
ADVANCES IN FRACTURE AND STRENGTH, PTS 1- 4 | 2005年 / 297-300卷
关键词
LCD; ITO; atmospheric pressure; glow plasma; cleaning;
D O I
10.4028/www.scientific.net/KEM.297-300.2351
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report on a novel method for the surface modification of indium tin oxide (ITO) in LCD glass by direct exposure to a dielectric barrier discharge (DBD) at atmospheric pressure and room temperature. To remove the organic contaminants from the surfaces of ITO film in LCD glass, the atmospheric pressure RF glow discharge plasma was used. Argon (Ar) and oxygen (O-2) were used as the carrier gas and reactive gas, respectively. The addition of O-2 gas to Ar decreased the contact angle of water and increased the surface cleaning rate due to the increase of oxygen radicals in the plasma. The chemical characteristics of ITO surface after the plama treatment were investigated using X-ray photoelectron spectroscopy (XPS), and new carboxyl group bond was produced. The contact angle of 64 degrees before the plasma treatment was decreased to 7 degrees in the processing condition with oxygen flow rate of 50 sccm, treatment speed of 100mm/sec, and input power of 300W. These hydrophilic effect will be very useful in the manufacturing processes of LCD glass.
引用
收藏
页码:2351 / 2355
页数:5
相关论文
共 10 条
[1]   OBSERVATION OF VIBRATIONAL ASYMMETRY IN THE HIGH-RESOLUTION MONOCHROMATIZED XPS OF HYDROCARBON POLYMERS [J].
BEAMSON, G ;
CLARK, DT ;
KENDRICK, J ;
BRIGGS, D .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1991, 57 (01) :79-90
[2]   Modification of the surface properties of a polypropylene (PP) film using an air dielectric barrier discharge plasma [J].
Cui, NY ;
Brown, NMD .
APPLIED SURFACE SCIENCE, 2002, 189 (1-2) :31-38
[3]   Application of atmospheric pressure dielectric barrier discharges in deposition, cleaning and activation [J].
Goossens, O ;
Dekempeneer, E ;
Vangeneugden, D ;
Van de Leest, R ;
Leys, C .
SURFACE & COATINGS TECHNOLOGY, 2001, 142 :474-481
[4]   STABLE GLOW PLASMA AT ATMOSPHERIC-PRESSURE [J].
KANAZAWA, S ;
KOGOMA, M ;
MORIWAKI, T ;
OKAZAKI, S .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1988, 21 (05) :838-840
[5]   Surface modification for hydrophilic property of stainless steel treated by atmospheric-pressure plasma jet [J].
Kim, MC ;
Song, DK ;
Shin, HS ;
Baeg, SH ;
Kim, GS ;
Boo, JH ;
Han, JG ;
Yang, SH .
SURFACE & COATINGS TECHNOLOGY, 2003, 171 (1-3) :312-316
[6]   A uniform glow discharge plasma source at atmospheric pressure [J].
Moon, SY ;
Choe, W ;
Kang, BK .
APPLIED PHYSICS LETTERS, 2004, 84 (02) :188-190
[7]  
Moulder J.F., 1979, HDB XRAY PHOTOELECTR
[8]  
Okazaki S., 1993, J PHOTOPOLYM SCI TEC, V6, P339, DOI DOI 10.2494/PHOTOPOLYMER.6.339
[9]  
ROTH JR, 1992, P 19 IEEE INT C PLAS
[10]   Oxide surface cleaning by an atmospheric pressure plasma [J].
Yi, CH ;
Jeong, CH ;
Lee, YH ;
Ko, YW ;
Yeom, GY .
SURFACE & COATINGS TECHNOLOGY, 2004, 177 :711-715