Laser irradiation, ion implantation and e-beam writing of integrated optical structures

被引:13
作者
Righini, GC [1 ]
Banyasz, I [1 ]
Berneschi, S [1 ]
Brenci, M [1 ]
Chiasera, A [1 ]
Cremona, M [1 ]
Ehrt, D [1 ]
Ferrari, M [1 ]
Montereali, RM [1 ]
Conti, GN [1 ]
Pelli, S [1 ]
Sebastiani, S [1 ]
Tosello, C [1 ]
机构
[1] CNR, Nello Carrara Inst Appl Phys, Optoelect & Photon Dept, I-50127 Florence, Italy
来源
PHOTONIC MATERIALS, DEVICES, AND APPLICATIONS, PTS 1 AND 2 | 2005年 / 5840卷
关键词
laser writing; ion implantation; electron-beam-writing; optical waveguides; integrated optics; gratings;
D O I
10.1117/12.609231
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Much attention is currently being paid to the materials and processes that allow one to directly write or to imprint waveguiding structures and/or diffractive elements for optical integrated circuits by exposure from a source of photons, electrons or ions. Here a brief overview of the results achieved in our laboratories is presented, concerning the fabrication and characterization of optical guiding structures based on different materials and exposure techniques. These approaches include: electron and ion beam writing of waveguides in (poly)-crystalline lithium fluoride, uv-laser printing of waveguides and gratings in photorefractive glass thin films, and fs-laser writing in tellurite glasses. Properties and perspectives of these approaches are also discussed.
引用
收藏
页码:649 / 657
页数:9
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