Composition analysis of semiconductor quantum wells by energy filtered convergent-beam electron diffraction

被引:2
作者
Jacob, D. [1 ]
Zuo, J. M. [3 ]
Lefebvre, A. [1 ]
Cordier, Y. [2 ]
机构
[1] Univ Sci & Technol Lille, Lab Struct & Proprietes Etat Solide, CNRS, UMR 8008, F-59655 Villeneuve Dascq, France
[2] CNRS, IEMN, UMR 8520, F-60069 Villeneuve Dascq, France
[3] Univ Illinois, F Seitz Mat Res Lab, Dept Mat Sci & Engn, Urbana, IL 61801 USA
关键词
transmission electron microscopy; convergent-beam electron diffraction; semiconductor quantum wells; composition analysis;
D O I
10.1016/j.ultramic.2007.06.001
中图分类号
TH742 [显微镜];
学科分类号
摘要
We show how energy-filtered convergent-beam electron diffraction (EFCBED) patterns can be used to determine the chemical composition of buried semiconductor strained quantum wells. Our method is based on a quantitative analysis of the intensities of high-order Bragg lines in the transmitted disc of EFCBED patterns taken from plan-view samples. This analysis makes it possible to determine the displacement vector R introduced between the top and bottom parts of the matrix by the deformation of the quantum well and consequently to determine its composition. This is illustrated in the case of an In(x)Ga(1-)xAs quantum well buried in a GaAs matrix. A detailed analysis of the effect of experimental parameters on Bragg lines intensity is performed. In particular, the importance of the choice of the diffraction vector is pointed out. The relative uncertainty on the measurement of the indium content x is found to be lower than 5% and a possible occurrence of slight compositional fluctuations in the (00 1) growth plane is pointed out. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:358 / 366
页数:9
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