Cat-CVD SiN passivation films for OLEDs and packaging

被引：14
|
作者：
Heya, Akira [1 ]
Minamikawa, Toshiharu [2 ]
Niki, Toshikazu [3 ]
Minami, Shigehira [3 ]
Masuda, Atsushi [4 ]
Umemoto, Hironobu [4 ]
Matsuo, Naoto [1 ]
Matsumura, Hideki [4 ]
机构：
[1] Univ Hyogo, Himeji, Hyogo 6712280, Japan
[2] Ind Res Inst Ishikawa, Kanazawa, Ishikawa 9208203, Japan
[3] Ishikawa Seisakusho Ltd, Haku San, Ishikawa 9240051, Japan
[4] Japan Adv Inst Sci & Technol, Nomi, Ishikawa 9231292, Japan
来源：
THIN SOLID FILMS | 2008年 / 516卷 / 05期
基金：
日本科学技术振兴机构;
关键词：
Cat-CVD; passivation; barrier film; roll to roll; silicon nitride; organic light-emitting diode; water vapor transmission rate; Ca corrosion test;
D O I：
10.1016/j.tsf.2007.06.220
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A Roll-to-roll type catalytic chemical vapor deposition (Cat-CVD) apparatus was developed for the application to flexible organic light-emitting diode (OLED) displays and packaging. Silicon nitride (SiNx) films were prepared by this roll-to-roll type apparatus at temperatures below 60 degrees C. It was found that these SiNx films are highly moisture resistant, and the water vapor transmission rate (WVTR) on plastic substrates could be lowered to 0.01 g/m(2) day. Roll-to-roll type Cat-CVD is one of the most promising methods for the preparation of barrier films for OILED displays and packaging. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码：553 / 557
页数：5
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