Environmentally Friendly Resistive Switching Memory Devices with DNA as the Active Layer and Bio-Based Polyethylene Furanoate as the Substrate

被引:35
作者
Lam, Jeun-Yan [1 ]
Jang, Guang-Way [5 ]
Huang, Cheng-Jyun [5 ]
Tung, Shill-Huang [1 ,2 ]
Chen, Wen-Chang [3 ,4 ]
机构
[1] Natl Taiwan Univ, Inst Polymer Sci & Engn, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Adv Res Ctr Green Mat Sci & Technol, Taipei 10617, Taiwan
[3] Natl Taiwan Univ, Inst Polymer Sci & Engn, Adv Res Ctr Green Mat Sci & Technol, Taipei 10617, Taiwan
[4] Natl Taiwan Univ, Dept Chem Engn, Taipei 10617, Taiwan
[5] Ind Technol Res Inst, Mat & Chem Res Labs, Hsinchu 30011, Taiwan
来源
ACS SUSTAINABLE CHEMISTRY & ENGINEERING | 2020年 / 8卷 / 13期
关键词
Polyethylene furanoate (PEF); Biobased; Deoxyribonucleic acid (DNA); Solution processable; Flexible resistive switching device; TEMPERATURE; COMPOSITE; MECHANISM; FILMS;
D O I
10.1021/acssuschemeng.9b07168
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The development of flexible electronics for wearable or implantable devices has become an exciting research area in recent years. With the transition from rigid to flexible devices, polymeric materials, in particular the fossil-based PET, have been extensively used as the device substrate. For the environmental sustainability reason, biobased products have drawn much attention as a green replacement for fossil-based polymers. In this work, poly(ethylene furanoate) (PEF), a 100% biobased polyester, was utilized to replace PET as the substrate, and the biopolymer, deoxyribonucleic acid (DNA), was applied as the active layer to form the all-polymer resistive switching memory devices that are fully solution processable. The devices demonstrated the writeonce-read-many-times (WORM) memory behavior with a low threshold voltage of approximately -2 V, an ON/OFF current ratio as high as 10(4), and a data retention time over 10(4) s. No noticeable degradation was observed under bending with various radius of curvature and after 1000 cycles of bending, suggesting an excellent endurance against severe and repeated deformation.
引用
收藏
页码:5100 / 5106
页数:7
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