A novel electron beam-induced reaction of sulfonium salt in the crystalline state

被引：9

作者：

Moon, S ^{[1
]}

Maekawa, Y ^{[1
]}

Yoshida, H ^{[1
]}

机构：

[1] Japan Atom Energy Res Inst, Takasaki Radiat Chem Res Estab, Dept Mat Dev, Gunma 3701292, Japan

来源：

CHEMISTRY LETTERS | 2001年 / 05期

关键词：

D O I：

10.1246/cl.2001.408

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The electron beam irradiation of triphenylsulfonium methanesulfonate in the crystalline state provides a new benzene-substituted sulfonium salt. This product has not been observed either by photolysis in the crystalline state nor by electron beam irradiation in a solution. The formation of the substitution product was confirmed by GC-MS analysis.

引用

页码：408 / 409

页数：2

共 19 条

[1] SYNTHESIS OF ARYL-SUBSTITUTED SULFONIUM SALTS BY THE P2O5-METHANESULFONIC ACID PROMOTED CONDENSATION OF SULFOXIDES WITH AROMATIC-COMPOUNDS [J].

AKHTAR, SR ;

CRIVELLO, JV ;

LEE, JL .

JOURNAL OF ORGANIC CHEMISTRY, 1990, 55 (13) :4222-4225

[2] PHOTOCHEMISTRY OF TRIARYLSULFONIUM SALTS [J].

DEKTAR, JL ;

HACKER, NP .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1990, 112 (16) :6004-6015

[3] CHEMICALLY AMPLIFIED IMAGING MATERIALS BASED ON ELECTROPHILIC AROMATIC-SUBSTITUTION - POLY[4-(ACETOXYMETHYL)STYRENE-CO-4-HYDROXYSTYRENE] [J].

FRECHET, JMJ ;

MATUSZCZAK, S ;

RECK, B ;

STOVER, HDH ;

WILLSON, CG .

MACROMOLECULES, 1991, 24 (08) :1746-1754

[4] POLY[PARA-(FORMYLOXY)STYRENE] - SYNTHESIS AND RADIATION-INDUCED DECARBONYLATION [J].

FRECHET, JMJ ;

TESSIER, TG ;

WILLSON, CG ;

ITO, H .

MACROMOLECULES, 1985, 18 (03) :317-321

[5] CATIONIC PHOTOINITIATORS - SOLID-STATE PHOTOCHEMISTRY OF TRIPHENYLSULFONIUM SALTS [J].

HACKER, NP ;

LEFF, DV ;

DEKTAR, JL .

MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 1990, 183 :505-511

[6] PHOTOCHEMISTRY OF TRIPHENYLSULFONIUM SALTS IN POLY[4-[(TERT-BUTOXYCARBONYL)OXY]STYRENE] - EVIDENCE FOR A DUAL PHOTOINITIATION PROCESS [J].

HACKER, NP ;

WELSH, KM .

MACROMOLECULES, 1991, 24 (08) :2137-2139

[7] TETRAHYDROPYRANYL PROTECTED POLYHYDROXYSTYRENE FOR A CHEMICALLY AMPLIFIED DEEP UV RESIST [J].

HAYASHI, N ;

UENO, T ;

HESP, S ;

TORIUMI, M ;

IWAYANAGI, T .

POLYMER, 1992, 33 (08) :1583-1588

[8]

Hirakawa N., 1999, Journal of Photopolymer Science and Technology, V12, P365, DOI 10.2494/photopolymer.12.365

[9] SYNTHESES OF ACETOPHENONE ENOL ESTER POLYMERS AND THEIR CONVERSION TO POLY(PHENYLACETYLENES) [J].

ITO, H ;

UEDA, M .

MACROMOLECULES, 1990, 23 (11) :2885-2894

[10] CHEMICAL AMPLIFICATION IN THE DESIGN OF DRY DEVELOPING RESIST MATERIALS [J].

ITO, H ;

WILLSON, CG .

POLYMER ENGINEERING AND SCIENCE, 1983, 23 (18) :1012-1018

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