Characteristics of highly orientated BiFeO3 thin films on a LaNiO3-coated Si substrate by RF sputtering

被引:4
|
作者
Liu, Yen-Ting [2 ]
Chen, San-Yuan [1 ]
Lee, Hsin-Yi [1 ,3 ]
机构
[1] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Program Sci & Technol Accelerator Light Source, Hsinchu 300, Taiwan
[3] Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan
关键词
X-ray diffraction; Thin films; RF sputtering; X-RAY; TEMPERATURE; REFLECTIVITY; SURFACE; GROWTH;
D O I
10.1016/j.tsf.2010.05.003
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
BiFeO3 (BFO) films were grown on LaNiO3-coated Si substrate by a RF magnetron sputtering system at temperatures in the range of 300-700 degrees C. X-ray reflectivity and high-resolution diffraction measurements were employed to characterize the microstructure of these films. For a substrate temperature below 300 degrees C and at 700 degrees C only partially crystalline films and completely randomly polycrystalline films were grown, whereas highly (001)-orientated BFO film was obtained for a substrate temperature in the range of 400-600 degrees C. The crystalline quality of BFO thin films increase as the deposition temperature increase except for the film deposited at 700 degrees C. The fitted result from X-ray reflectivity curves show that the densities of the BFO films are slightly less than their bulk values. For the BFO films deposited at 300-600 degrees C, the higher the deposition temperature, the larger the remnant polarization and surface roughness of the films present. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:7412 / 7415
页数:4
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