Nucleation Control for Large, Single Crystalline Domains of Mono layer Hexagonal Boron Nitride via Si-Doped Fe Catalysts

被引：138

作者：

Caneva, Sabina ^{[1
]}

Weatherup, Robert S. ^{[1
]}

Bayer, Bernhard C. ^{[1
,2
]}

Brennan, Barry ^{[3
]}

Spencer, Steve J. ^{[3
]}

Mingard, Ken ^{[3
]}

Cabrero-Vilatela, Andrea ^{[1
]}

Baehtz, Carsten ^{[4
]}

Pollard, Andrew J. ^{[3
]}

Hofmann, Stephan ^{[1
]}

机构：

[1] Univ Cambridge, Dept Engn, Cambridge CB3 0FA, England

[2] Univ Vienna, Fac Phys, A-1090 Vienna, Austria

[3] Natl Phys Lab, Teddington TW11 0LW, Middx, England

[4] Helmholtz Zentrum Dresden Rossendorf, Inst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany

来源：

NANO LETTERS | 2015年 / 15卷 / 03期

基金：

欧洲研究理事会; 芬兰科学院; 英国工程与自然科学研究理事会;

关键词：

Hexagonal boron nitride (h-BN); chemical vapor-deposition (CVD); borazine (HBNH)(3); in situ X-ray diffraction (XRD); secondary ion mass spectrometry (SIMS); Fe catalyst; CHEMICAL-VAPOR-DEPOSITION; TEMPERATURE GRAPHENE GROWTH; LARGE-SCALE SYNTHESIS; H-BN MONOLAYER; 2-DIMENSIONAL MATERIALS; POLYCRYSTALLINE COPPER; IRON; NANOSHEETS; NANOTUBES; FOIL;

D O I：

10.1021/nl5046632

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of similar to 0.3 mm, and of continuous h-BN monolayer films With large domain sizes (>25 mu m) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-filth Fe/'SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes, a basis for further rational catalyst design for compound 2D materials.

引用

页码：1867 / 1875

页数：9

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