Grain Boundary Diffusion of Ni through Au-Doped Ni3Sn2 Intermetallic Compound for Technological Applications

被引:3
作者
Zhu, Z. X. [1 ]
Renganathan, Vengudusamy [1 ]
Kao, C. R. [1 ]
机构
[1] Natl Taiwan Univ, Dept Mat Sci & Engn, Taipei, Taiwan
关键词
Solid-liquid interdiffusion; insulated-gate bipolar transistor; AuSn; aging time; direct bonded copper substrate; POWER ELECTRONICS; CU-SN; INTERDIFFUSION; CIRCUITS; ENERGY; IMPACT;
D O I
10.1007/s11664-021-09282-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In recent years Au-Sn solid-liquid interdiffusion (SLID) has become a widely known bonding method to deliver promising die attaching techniques for high-temperature operating electronic vehicles. Insulated-gate bipolar transistor (IGBT) chips were assembled on direct bonded copper substrates by utilizing a Ni/Au-20Sn/Ni system based on SLID. Our previous research investigated the intermetallic compounds formed after isothermal aging. Electron microscopic instrumentation was employed to determine the interfacial reactions between AuSn and nickel (Ni). After total consumption of AuSn at the rim sites of (Ni, Au)(3)Sn-2 grains, an increased concentration of Ni was identified. Prolongation of aging time at 240 degrees C helped in precipitation of Ni3Sn at the interface of (Ni, Au)(3)Sn-2 and Ni. This current research has theorized the mechanism of the intermetallic compounds formed at the rim sites of the Au-Sn System. From the results, the Au-Sn eutectic system attained in this article is ideal to assemble an IGBT for high-temperature devices using SLID.
引用
收藏
页码:6590 / 6596
页数:7
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