共 34 条
[1]
[Anonymous], P 2012 38 IEEE PHOT
[2]
CREATION OF DEEP GAP STATES IN SI DURING CL2 OR HBR PLASMA ETCH EXPOSURES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1993, 11 (04)
:1332-1336
[4]
COMPARISON OF ADVANCED PLASMA SOURCES FOR ETCHING APPLICATIONS .4. PLASMA-INDUCED DAMAGE IN A HELICON AND A MULTIPOLE ELECTRON-CYCLOTRON-RESONANCE SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1994, 12 (03)
:1340-1350