On the evolution of surface morphology of polysilicon MEMS structures during fatigue

被引:29
作者
Shrotriya, P [1 ]
Allameh, SM [1 ]
Soboyejo, WO [1 ]
机构
[1] Princeton Univ, Dept Mech & Aerosp Engn, Princeton, NJ 08544 USA
关键词
polysilicon MEMS; fatigue; surface reaction; stress-assisted dissolution; surface topology evolution; linear stability analysis;
D O I
10.1016/S0167-6636(03)00029-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper presents the results of a combined experimental and computational study of surface topology evolution preceding fatigue crack nucleation in polysilicon MEMS structures. The evolution in surface topology observed during the crack nucleation stage is related to the underlying notch-tip stress distributions calculated using the finite element method. Measured changes in surface topography due to the stress-assisted dissolution of silica are shown to be predicted by a linear stability analysis. The implications of the results are discussed for modeling of fatigue in polysilicon MEMS structures. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码:35 / 44
页数:10
相关论文
共 22 条
[1]  
ALLAMEH S, 2000, MECH PROPERTIES STRU
[2]  
Brown S. B., 1993, Proceedings. IEEE. Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.93CH3265-6), P99, DOI 10.1109/MEMSYS.1993.296960
[3]  
BROWN SB, 1997, P TRANSDUCERS, V1, P607
[4]   MOLECULAR MECHANISMS FOR CORROSION OF SILICA AND SILICATE-GLASSES [J].
BUNKER, BC .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1994, 179 :300-308
[5]   MICROMECHANICAL FATIGUE TESTING [J].
CONNALLY, JA ;
BROWN, SB .
EXPERIMENTAL MECHANICS, 1993, 33 (02) :81-90
[6]   SLOW CRACK-GROWTH IN SINGLE-CRYSTAL SILICON [J].
CONNALLY, JA ;
BROWN, SB .
SCIENCE, 1992, 256 (5063) :1537-1539
[7]  
FREEMAN DM, 1998, P SOL STAT SENS ACT, P150
[8]  
Iler R.K., 1979, The chemistry of silica
[9]   Electrostatically actuated failure of microfabricated polysilicon fracture mechanics specimens [J].
Kahn, H ;
Ballarini, R ;
Mullen, RL ;
Heuer, AH .
PROCEEDINGS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1999, 455 (1990) :3807-3823
[10]   Evolution of a surface-roughness spectrum caused by stress in nanometer-scale chemical etching [J].
Kim, KS ;
Hurtado, JA ;
Tan, H .
PHYSICAL REVIEW LETTERS, 1999, 83 (19) :3872-3875