Thermal Conductivity of Anodic Alumina Film at (220 to 480) K by Laser Flash Technique

被引:24
作者
Cai, An [1 ,2 ]
Yang, Li-ping [1 ]
Chen, Jiang-ping [2 ]
Xi, Tong-geng [1 ]
Xin, Shi-gang [1 ]
Wu, Wei [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
[2] Shanghai Jiao Tong Univ, Shanghai 200240, Peoples R China
基金
中国国家自然科学基金;
关键词
DIFFUSIVITY; ARRAYS;
D O I
10.1021/je100437j
中图分类号
O414.1 [热力学];
学科分类号
摘要
The thermal conductivity at (220 to 480) K of anodic alumina film of (1.4 to 5) mu m thick and about 30 % porosity, which is grown from aluminum foil, is reported. A laser flash technique was employed to carry out measurements of thermal diffusivity of layered anodic aluminum specimen, while the effective thermal conductivity of anodic alumina film was determined using a two-layered model, which is 1.22 W.m(-1).K(-1) at 220 K and 1.71 W.m(-1).K(-1) at 480 K. Agreement in the overlapping temperature range (220 to 300) K with the measurements of Chen is found. The results showed that the thermal conductivity of anodic alumina films has a temperature dependence of amorphous solids, and the apparent thickness dependence of thermal conductivity is not found for anodic alumina films.
引用
收藏
页码:4840 / 4843
页数:4
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