Photopatterning of Low Dielectric Constant Cycloolefin Polymers Using Azides and Diazirines

被引：32

作者：

Burgoon, Hugh ^{[1
]}

Cyrus, Crystal ^{[1
]}

Skilskyj, Doug ^{[1
]}

Thoresen, Jennifer ^{[1
]}

Ebner, Carl ^{[1
]}

Meyer, Gerhard A. ^{[1
]}

Filson, Paul ^{[1
]}

Rhodes, Larry F. ^{[1
]}

Backlund, Tomas ^{[2
]}

Meneau, Aurelie ^{[2
]}

Cull, Toby ^{[2
]}

Afonina, Irina ^{[2
]}

机构：

[1] Promerus LLC, Brecksville, OH 44141 USA

[2] Merck Chem Ltd, Southampton SO16 7QD, Hants, England

来源：

ACS APPLIED POLYMER MATERIALS | 2020年 / 2卷 / 05期

关键词：

bis(azide); bis(diazirine); polynorbornene; photopatterning; low dielectric constant;

D O I：

10.1021/acsapm.0c00043

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Polymers are widely used as insulators in electronic devices. Low dielectric constant polymers are desirable since this lowers the potential for unintentional crosstalk and inductive coupling between conductors. Attempts to photopattern a low dielectric constant polymer, poly(5-hexyl-2-norbornene) (poly(1)), with a bis(azide) were unsuccessful. Incorporation of butenyl pendent groups improved patterning, but the dielectric constant of the cross-linked film was relatively high (2.60). A difunctional bis(diazirine) (compound 4) was synthesized and characterized by NMR and MS. Compound 4 rendered unreactive, aliphatic cycloolefin polymers such as poly(1) photopatternable, yielding negative tone patterns with good resolution. The dielectric constant of films cross-linked with compound 4 was substantially lower than the films cross-linked with bis(azide) (2.09 for poly(1)).

引用

页码：1819 / 1826

页数：8

共 25 条

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