Influence of substrate temperature on the structural, electrical and optical properties of Al-doped ZnO films by RF magnetron sputtering

被引：0

作者：

Sun, Yihua ^{[1
]}

Li, Chenhui ^{[2
]}

Xiong, Weihao ^{[2
]}

Huang, Caihua ^{[1
]}

机构：

[1] China Three Gorges Univ, Coll Mech & Mat Engn, Yichang 443002, Peoples R China

[2] Huazhong Univ Sci & Technol, State Key Lab Mat Proc & Die & Mould Technol, Wuhan 430074, Peoples R China

来源：

APPLICATIONS OF ENGINEERING MATERIALS, PTS 1-4 | 2011年 / 287-290卷

关键词：

Al-doped ZnO; Magnetron sputtering; Deposition temperature; Transparent conducting oxide; CHEMICAL-VAPOR-DEPOSITION; PULSED-LASER DEPOSITION; THIN-FILMS; ZINC-OXIDE; TRANSPARENT; TARGET; GROWTH; CONDUCTIVITY; PARAMETERS;

D O I：

10.4028/www.scientific.net/AMR.287-290.2308

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Transparent conducting aluminum-doped zinc oxide (AZO) films have been prepared on soda-lime glass substrates by radio frequency magnetron sputtering using a high density ceramic target at different substrate temperatures. The structural, morphology, electrical, and optical properties of the AZO thin films were investigated by X-ray diffraction, scanning electron microscope, Hall measurement, and optical transmission spectroscopy, and which were strongly influenced by substrate temperatures. Films with better texture, higher transmission, lower resistivity and larger carrier concentration were obtained for the samples fabricated at higher substrate temperature. The AZO film with the lowest resistivity of 4.63x10(-4) Omega.cm and an average optical transmission of 92% in the visible range was deposited on the substrate heated at 450 degrees C. The optical bandgap depends on the deposition condition, and was in the range of 3.35-3.59 eV.

引用

页码：2308 / +

页数：2

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