Lifetime and DLTS studies of interstitial Fe in p-type Si

被引:1
作者
Syre, M. [1 ]
Monakov, E. [1 ,2 ]
Holt, A. [1 ]
Svensson, B. G. [2 ]
机构
[1] Inst Energy Technol IFE, Solar Energy Dept, POB 40, N-2027 Kjeller, Norway
[2] Univ Oslo, Dept Phys, N-0316 Oslo, Norway
来源
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 3 | 2011年 / 8卷 / 03期
关键词
interstitial iron; FeB pairs; lifetime; mu-PCD; DLTS; TRANSIENT SPECTROSCOPY; SILICON; IRON;
D O I
10.1002/pssc.201000256
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Fe is one of the most prominent metallic impurities in solar-grade Si. In this work we have investigated the kinetics of in-diffusion and formation of the interstitial fraction (Fe-i). P-type Cz-Si with a resistivity of 10 Omega-cm has been intentionally contaminated with Fe by in-diffusion from a surface layer of FeCl3 at 700 degrees C followed by cooling with a rate of similar to 3.3 K/s. The concentration of Fe-i has been measured both by microwave photo conductance decay (mu-PCD) and deep level transient spectroscopy (DLTS). In the mu-PCD measurements, the Fe-i concentration has been determined using the effect of light-induced splitting of the iron-boron pairs (FeB), while in the DLTS measurements Fe-i has been monitored by the donor electronic state at 0.43 eV above the valence band. We have observed a linear dependence between the minority carrier lifetime (tau) and the inverse Fe-i concentration. This confirms Fe-i as the dominating recombination centre. In the present investigations we use a material relevant for solar cells with a resistivity of 10 Omega-cm. We have found that the concentration of interstitial iron decreases with increasing time for in-diffusion of Fe, provided identical cooling condition. This decreasing concentration of Fe-i is believed to be due to formation of more iron precipitates that serve as sinks for fast diffusing Fe-i. A high temperature anneal at 1000 degrees C for 1 minute followed by fast cooling (similar to 33 K/s) results in dissolution of the precipitates and freezing Fe into interstitial positions, where the concentration of Fe-i increases with increasing in-diffusion time. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:721 / 724
页数:4
相关论文
共 11 条
  • [1] A STUDY OF IRON-RELATED CENTERS IN HEAVILY BORON-DOPED SILICON BY DEEP-LEVEL TRANSIENT SPECTROSCOPY
    AWADELKARIM, OO
    MONEMAR, B
    [J]. JOURNAL OF APPLIED PHYSICS, 1988, 64 (11) : 6306 - 6310
  • [2] THE PROPERTIES OF IRON IN SILICON
    GRAFF, K
    PIEPER, H
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : 669 - 674
  • [3] Iron contamination in silicon technology
    Istratov, AA
    Hieslmair, H
    Weber, ER
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2000, 70 (05): : 489 - 534
  • [4] Iron and its complexes in silicon
    Istratov, AA
    Hieslmair, H
    Weber, ER
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (01): : 13 - 44
  • [5] Iron detection in crystalline silicon by carrier lifetime measurements for arbitrary injection and doping
    Macdonald, DH
    Geerligs, LJ
    Azzizi, A
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 95 (03) : 1021 - 1028
  • [6] OPTICAL AND THERMAL IONIZATION OF IRON-RELATED DEFECTS IN SILICON
    NAKASHIMA, K
    CHIJIIWA, M
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (02): : 234 - 237
  • [7] Ramappa DA, 1998, MATER RES SOC SYMP P, V481, P345
  • [8] EFFECT OF TITANIUM, COPPER AND IRON ON SILICON SOLAR-CELLS
    ROHATGI, A
    DAVIS, JR
    HOPKINS, RH
    RAICHOUDHURY, P
    MCMULLIN, PG
    MCCORMICK, JR
    [J]. SOLID-STATE ELECTRONICS, 1980, 23 (05) : 415 - +
  • [9] OVERLAPPING ELECTRON TRAPS IN N-TYPE SILICON STUDIED BY CAPACITANCE TRANSIENT SPECTROSCOPY
    SVENSSON, BG
    RYDEN, KH
    LEWERENTZ, BMS
    [J]. JOURNAL OF APPLIED PHYSICS, 1989, 66 (04) : 1699 - 1704
  • [10] WUNSTEL K, 1982, APPL PHYS A-MATER, V27, P207, DOI 10.1007/BF00619081