共 37 条
Compact, high resolution, four wave lateral shearing interferometer
被引:19
作者:
Chanteloup, JC
[1
]
Cohen, M
[1
]
机构:
[1] Univ Paris 06, Ecole Polytech, Lab Utilisat Lasers Intenses, UMR 7605,CEA,CNRS, F-91128 Palaiseau, France
来源:
OPTICAL FABRICATION, TESTING, AND METROLOGY
|
2004年
/
5252卷
关键词:
wave front sensing;
interferometry;
Shack-Hartmann;
Hartmann mask;
D O I:
10.1117/12.513739
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
A simple, ultra-compact, four wave achromatic interferometric technique is used to measure with high accuracy and high transverse resolution wavefront of polychromatic lightsource. The wave front to be measured is replicated by a diffraction grating into four copies interfering together leading to an interference pattern very similar to the intensity distribution obtained in the focal plane of a Shack-Hartmann microlens array. The grating is made of optical glass modulated in depth on top of which a chromium mask is printed. The amplitude mask acts like a Hartmann plate. Used in association with the phase mask, it allows suppression of the unwanted zero and second orders. A CCD detector located in the vicinity of the grating records the interference pattern. This new wavefront sensor is able to resolve wavefront spatial frequencies 3 to 4 times higher than a conventional Shack-Hartmann technique using an equivalent CCD detector. Its dynamic is also much higher.
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页码:282 / 292
页数:11
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