Compact, high resolution, four wave lateral shearing interferometer

被引:19
作者
Chanteloup, JC [1 ]
Cohen, M [1 ]
机构
[1] Univ Paris 06, Ecole Polytech, Lab Utilisat Lasers Intenses, UMR 7605,CEA,CNRS, F-91128 Palaiseau, France
来源
OPTICAL FABRICATION, TESTING, AND METROLOGY | 2004年 / 5252卷
关键词
wave front sensing; interferometry; Shack-Hartmann; Hartmann mask;
D O I
10.1117/12.513739
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A simple, ultra-compact, four wave achromatic interferometric technique is used to measure with high accuracy and high transverse resolution wavefront of polychromatic lightsource. The wave front to be measured is replicated by a diffraction grating into four copies interfering together leading to an interference pattern very similar to the intensity distribution obtained in the focal plane of a Shack-Hartmann microlens array. The grating is made of optical glass modulated in depth on top of which a chromium mask is printed. The amplitude mask acts like a Hartmann plate. Used in association with the phase mask, it allows suppression of the unwanted zero and second orders. A CCD detector located in the vicinity of the grating records the interference pattern. This new wavefront sensor is able to resolve wavefront spatial frequencies 3 to 4 times higher than a conventional Shack-Hartmann technique using an equivalent CCD detector. Its dynamic is also much higher.
引用
收藏
页码:282 / 292
页数:11
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