Wafer Scale Synthesis of Dense Aligned Arrays of Single-Walled Carbon Nanotubes

被引：72

作者：

Zhou, Weiwei ^{[1
]}

Rutherglen, Christopher ^{[1
]}

Burke, Peter J. ^{[1
]}

机构：

[1] Univ Calif Irvine, Dept Elect Engn & Comp Sci, Irvine, CA 92697 USA

来源：

NANO RESEARCH | 2008年 / 1卷 / 02期

关键词：

Single-walled carbon nanotubes (SWNTs); chemical vapor deposition (CVD); photolithography; microcontact printing (mu CP);

D O I：

10.1007/s12274-008-8012-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Here we present an easy one-step approach to pattern uniform catalyst lines for the growth of dense, aligned parallel arrays of single-walled carbon nanotubes (SWNTs) on quartz wafers by using photolithography or polydimethylsiloxane (PDMS) stamp microcontact printing (mu CP). By directly doping an FeCl3/methanol solution into Shipley 1827 photoresist or polyvinylpyrrolidone (PVP), various catalyst lines can be well-patterned on a wafer scale. In addition, during the chemical vapor deposition (CVD) growth of SWNTs the polymer layers play a very important role in the formation of mono-dispersed nanoparticles. This universal and efficient method for the patterning growth of SWNTs arrays on a surface is compatible with the microelectronics industry, thus enabling of the fabrication highly integrated circuits of SWNTs.

引用

页码：158 / 165

页数：8

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