Multiferroic properties of sputtered BiFeO3 thin films

被引：107
|
作者：
Li, Yibin [1 ,2 ]
Sritharan, Thirumany [1 ]
Zhang, Sam [3 ]
He, Xiaodong [2 ]
Liu, Yang [4 ]
Chen, Tupei [4 ]
机构：
[1] Nanyang Technol Univ, Sch Mat Sci & Engn, Singapore 639798, Singapore
[2] Harbin Inst Technol, Sch Astronaut, Ctr Composite Mat, Harbin 150001, Peoples R China
[3] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore 639798, Singapore
[4] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
来源：
APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 13期
关键词：
D O I：
10.1063/1.2901871
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A cosputtering method was used to deposit BiFeO3 thin films on Pt/Ti/SiO2/Si substrates. It was confirmed as a polycrystalline film with a tetragonal crystal structure in the annealed state. Both Fe2+ and Fe3+ ions were found to coexist in the film. The leakage current density is as low as 10(-3) A/cm(2) at 120 kV/cm. This sputtered film shows multiferroic properties exhibiting a saturated ferroelectric loop with a large remnant polarization of 37 mu C/cm(2) and a saturated ferromagnetic loop with saturation magnetization of 21 emu/cm(3) at room temperature.
引用
收藏
页数：3
相关论文
共 50 条
  • [21] Expansion of the spin cycloid in multiferroic BiFeO3 thin films
    Stuart R. Burns
    Daniel Sando
    Bin Xu
    Bertrand Dupé
    Lachlan Russell
    Guochu Deng
    Richard Clements
    Oliver H. C. Paull
    Jan Seidel
    Laurent Bellaiche
    Nagarajan Valanoor
    Clemens Ulrich
    npj Quantum Materials, 4
  • [22] Multiferroic BiFeO3 thin films: Structural and magnetic characterization
    Ali, Z.
    Atta, A.
    Abbas, Y.
    Sedeek, K.
    Adam, A.
    Abdeltwab, E.
    THIN SOLID FILMS, 2015, 577 : 124 - 127
  • [23] Expansion of the spin cycloid in multiferroic BiFeO3 thin films
    Burns, Stuart R.
    Sando, Daniel
    Xu, Bin
    Dupe, Bertrand
    Russell, Lachlan
    Deng, Guochu
    Clements, Richard
    Paull, Oliver H. C.
    Seidel, Jan
    Bellaiche, Laurent
    Valanoor, Nagarajan
    Ulrich, Clemens
    NPJ QUANTUM MATERIALS, 2019, 4 (1)
  • [24] Ferroelectric size effects in multiferroic BiFeO3 thin films
    Chu, Y. H.
    Zhao, T.
    Cruz, M. P.
    Zhan, Q.
    Yang, P. L.
    Martin, L. W.
    Huijben, M.
    Yang, C. H.
    Zavaliche, F.
    Zheng, H.
    Ramesh, R.
    APPLIED PHYSICS LETTERS, 2007, 90 (25)
  • [25] Integration of multiferroic BiFeO3 thin films into heterostructures for spintronics
    Bea, Helene
    Bibes, Manuel
    Herranz, Gervasi
    Zhu, Xiao-Hong
    Fusil, Stephane
    Bouzehouane, Karim
    Jacquet, Eric
    Deranlot, Cyrile
    Barthelemy, Agnes
    IEEE TRANSACTIONS ON MAGNETICS, 2008, 44 (07) : 1941 - 1945
  • [26] Soft chemical deposition of BiFeO3 multiferroic thin films
    Gonzalez, A. H. M.
    Simoes, A. Z.
    Cavalcante, L. S.
    Longo, E.
    Varela, J. A.
    Riccardi, C. S.
    APPLIED PHYSICS LETTERS, 2007, 90 (05)
  • [27] Nanoscale domain control in multiferroic BiFeO3 thin films
    Chu, Ying-Hao
    Zhan, Qian
    Martin, Lane W.
    Cruz, Maria P.
    Yang, Pei-Ling
    Pabst, Gary W.
    Zavaliche, Florin
    Yang, Seung-Yeul
    Zhang, Jing-Xian
    Chen, Long-Qing
    Schlom, Darrell G.
    Lin, I. -Nan
    Wu, Tai-Bor
    Ramesh, Ramamoorthy
    ADVANCED MATERIALS, 2006, 18 (17) : 2307 - +
  • [28] Control of the Cation Stoichiometry in the Multiferroic BiFeO3 Thin Films
    Kartavtseva, M. S.
    Gorbenko, O. Yu.
    Kaul, A. R.
    Fusil, S.
    Barthelemy, A.
    Bouzehouane, K.
    FERROELECTRICS, 2008, 374 : 164 - 169
  • [29] Emergent strain engineering of multiferroic BiFeO3 thin films
    Sun, Fei
    Chen, Deyang
    Gao, Xingsen
    Liu, Jun-Ming
    JOURNAL OF MATERIOMICS, 2021, 7 (02) : 281 - 294
  • [30] Influence of La and Ru Dopants on Multiferroic Properties of Polycrystalline BiFeO3 Thin Films
    Yan, Feng
    Zhu, Tie-Jun
    Lai, Man-On
    Lu, Li
    APPLIED PHYSICS EXPRESS, 2011, 4 (11)
12345