Temperature and Stress effects on IMC Behavior of Thin Film Cu-Al System in Wire Bond

被引:1
|
作者
Ming, XueFei
Fan, KunQuan
机构
来源
CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2011 (CSTIC 2011) | 2011年 / 34卷 / 01期
关键词
COPPER WIRE;
D O I
10.1149/1.3567631
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Wire bond is widely accepted as a predominant method for the area of electronic packaging. In this paper, authors focus on the nanoscale interfacial characteristics of thermosonic copper ball bonding on the aluminum metallization. A series of examinations and a 2.5D finite element simulation have been designed to find the IMC generation and the stress distribution. By TEM and SEM analysis, it was found at different temperatures, the IMC layers showed great difference in the thickness. By XRD and TEM analysis, the IMC also show different structures. By the finite element analysis, authors found the stress distribution when copper was bonding on the aluminum pad. By doing the research, people can have a general idea of the proper temperature and force when using copper wire bond.
引用
收藏
页码:529 / 534
页数:6
相关论文
共 4 条
  • [1] Intermetallic compound formation at Cu-Al wire bond interface
    Bae, In-Tae
    Jung, Dae Young
    Chen, William T.
    Du, Yong
    JOURNAL OF APPLIED PHYSICS, 2012, 112 (12)
  • [2] Effects of Cu/Al intermetallic compound (IMC) on copper wire and aluminum pad bondability
    Kim, HJ
    Lee, JY
    Paik, KW
    Koh, KW
    Won, JH
    Choe, SY
    Lee, J
    Moon, JT
    Park, YJ
    IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, 2003, 26 (02): : 367 - 374
  • [3] Comprehensive transmission electron microscopy study on Cu-Al intermetallic compound formation at wire bond interface
    Bae, In-Tae
    Jung, Dae Young
    Chen, William T.
    Chen, Scott
    Chang, Jenny
    JOURNAL OF MATERIALS RESEARCH, 2014, 29 (23) : 2787 - 2798
  • [4] Electrochemical studies of Pd-doped Cu and Pd-doped Cu-Al intermetallics for understanding corrosion behavior in wire-bonding packages
    Wu, Yuelin
    Subramanian, K. N.
    Barton, Scott Calabrese
    Lee, Andre
    MICROELECTRONICS RELIABILITY, 2017, 78 : 355 - 361