Plasma doping (PD) for ultra-shallow junction

被引：1
|
作者：
Mizuno, B. [1 ]
Okashita, K. [1 ]
Nakamoto, K. [1 ]
Jin, C. G. [1 ]
Sasaki, Y. [1 ]
Tsutsui, K.
Sauddin, H. A.
Iwai, H.
机构：
[1] Ultimate Junct Technol Inc, Osaka 5708501, Japan
来源：
EXTENDED ABSTRACTS 2008 INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY | 2008年
关键词：
D O I：
10.1109/IWJT.2008.4540009
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：20 / 24
页数：5
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